| Pumping Speed ISO200/200CF |
N2: 1100 l/s, He: 1320 l/s, H2: 1050 l/s |
| Pumping Speed ISO250/250CF |
N2: 1500 l/s, He: 1450 l/s, H2: 1150 l/s |
| Compression Ratio |
N2: >10E+12, He: >1X10E+8, H2: 3X10E+6 |
| Nominal Rotational Speed |
36000 1/min |
| Recommended Backing Pump |
Diaphragm Pump: MD-4T, Rotary Vane: DUO010M |
| Recommended Controller |
Pfeiffer TCP-380/600 |
| Weight |
53kg/117lbs. |
| Applications Include |
HDP Etching, Plasma RI Etching, HDP-CVD, PVD Sputtering, Ion Implantation, MBE, Thin Film, Vacuum Process, R&D, UHV Applications, Acceleration & Storage Ring Technology
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