| Pumping Speed |
N2: 480 l/s, He: 460 l/s, H2: 460 l/s |
| Compression Ratio |
N2: >10E+8, He: 5X10E+5, H2: 2X10E+4 |
| Ultimate Pressure |
Without Anti-Corrosion: ICF Flange: 10-10 Torr, VG/ISO Flange: 5X10-8 Torr, Chemical Specific Type: ICF Flange: 10-9 Torr, VG/ISO Flange: 5X10-8 Torr |
| Rated Speed |
25000 to 48000 rpm |
| Installation Position |
Free |
| Cooling Method |
Natural Air Cooling |
| Mass |
12kg/26.4lbs. |
| Applications Include |
Plasma Etch, Electron Cyclotron Resonance, Film Deposition, Sputtering, Ion Implantation, MBE, Diffusion, Photo Resist Stripping, Crystal Growth, Water Inspection, Load-Lock Chambers.
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