| Rotational Speed |
39000 rpm |
| Pumping Speed ISO100K |
N2: 320 l/s, He: 290 l/s, H2: 180 l/s |
| Pumping Speed ISO160K |
N2: 410 l/s, He: 360 l/s, H2: 230 l/s |
| Compression Ratio |
N2: 1X10E+8, He: 2X10E+3, H2: 1X10E+2 |
| Ultimate Pressure Without Purge |
8X10-9 mbar |
| Recommended Backing Pump |
ADP31 |
| Recommended Controller |
ACT-600M |
| Weight |
19kg/41.8lbs. |
| Applications Include |
Metal Etching, Dielectric Etch, Interconnect Etch, PECVD, Ion Implantation, Sputtering, Electron Microscopes, Plasma Disposition, R&D, Particle Accelerators, Space Simulation
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